Preparation and photoelectric properties of F-doped cuprous oxide thin films

Yong-bin Wu,Yan Li,Ying-jie Zhao,Wei Zhou,Fu-xin Zhong
DOI: https://doi.org/10.1016/j.optmat.2020.110167
IF: 3.754
2021-01-01
Optical Materials
Abstract:<p>F-doped Cu<sub>2</sub>O films were deposited on Cu sheet substrates by hydrothermal method with different doping concentrations of F<sup>−</sup>. The structure, morphology, composition and forbidden bandwidth of the samples were characterized by XRD, SEM, EDS, UV–Vis and XPS. The photoelectric properties, capacitance-voltage and AC impedance characteristics were also studied. The undoped and F-doped Cu<sub>2</sub>O thin films are all p-type semiconductors. When the doping concentration of F<sup>−</sup> is 0.002 mol/L, the preferential growth surfaces are (110), (111) and (200), and the crystallinity of (111) plane is optimal. After doping, the grain size of F-doped Cu<sub>2</sub>O is relatively uniform. The mass percentage of F element is 0.34% and the forbidden bandwidth reduces from 1.96 eV to 1.91 eV. Photovoltage and photocurrent density increase to 0.4457 V and 2.79 mA/cm<sup>2</sup>, respectively. And the carrier concentration increases from 4.55 × 10<sup>18</sup> to 2.58 × 10<sup>22</sup> cm<sup>−3</sup>. The resistance value under light reduces from 183.4 Ω to 55.8 Ω.</p>
materials science, multidisciplinary,optics
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