Ultrahigh-reflective optical thin films prepared by reactive magnetron sputtering with RF-induced substrate bias

Tung-Hsun Chung,Xiao-Lu Zou,Qi-Hang Zhang,Meng Wang,Xian-Qing Zhu,Ming-Xuan Zhang,Qian-Cheng Lin,Rong Liao,Xing-Yang Cui,Jun Zhang,Ping Xu,Han-Ning Dai,Yu-Ao Chen,Yong-Heng Huo,Jian-Wei Pan
DOI: https://doi.org/10.1063/5.0169714
IF: 1.6
2024-04-01
Review of Scientific Instruments
Abstract:Optical thin films with high-reflectivity (HR) are essential for applications in quantum precision measurements. In this work, we propose a coating technique based on reactive magnetron sputtering with RF-induced substrate bias to fabricate HR-optical thin films. First, atomically flat SiO2 and Ta2O5 layers have been demonstrated due to the assistance of radio-frequency plasma during the coating process. Second, a distributed Bragg reflector (DBR) mirror with an HR of ∼99.999 328% centered at 1397 nm has been realized. The DBR structure is air-H{LH}19-substrate, in which the L and H denote a single layer of SiO2 with a thickness of 237.8 nm and a single layer of Ta2O5 with a thickness of 171.6 nm, respectively. This novel coating method would facilitate the development of HR reflectors and promote their wide applications in precision measurements.
instruments & instrumentation,physics, applied
What problem does this paper attempt to address?