Fabrication of Niobium Weak Links by Means of Electron Beam Lithography and Ion Implantation

Kenji Gamo,Atsuhiro Kajiya,Susumu Namba
DOI: https://doi.org/10.7567/jjaps.18s1.201
IF: 1.5
1979-01-01
Japanese Journal of Applied Physics
Abstract:Niobium weak links have been fabricated by means of electron beam lithography and nitrogen ion implantation, and current-voltage characteristics, the temperature and the applied magnetic field dependence of a maximum zero-voltage current and dose dependence of major junction parameters have been measured. At a low temperature below a critical temperature, self heating effect was significant and large hysterisis in current-voltage characteristics appeared and no Josephson effect was observed. At a temperature above the critical temperature, a maximum zero-voltage current shows periodic dependence on an applied magnetic field similar to the Fraunhofer pattern. A normal junction resistance increased and Tc decreased with increasing a dose, which are thought to be due to radiation damage. It was found that the present techniques provide useful means to fabricate Josephson junctions with desired characteristics.
physics, applied
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