Multilayer Fe3O4-doped ITO indium saving indium tin oxide thin films

S. Petrovska,R. Sergiienko,B. Ilkiv,T. Nakamura,M. Ohtsuka
DOI: https://doi.org/10.1080/15421406.2024.2355397
IF: 0.7
2024-06-05
Molecular Crystals and Liquid Crystals
Abstract:Multilayer Fe 3 O 4 -doped indium saving indium-tin oxide (ITO) thin films were fabricated by sputtering method. Double-layered Fe 3 O 4 -doped indium saving indium-tin oxide (ITO) thin films consisted of 12 nm layer of conventional indium tin oxide (90 mass% In 2 O 3 and 10 mass% SnO 2 ) and 138 nm layer of indium saving indium-tin oxide (50 mass% In 2 O 3 , 50 mass% SnO 2 and Fe 3 O 4 -doped) were grown on preheated at 523 K glass substrates. Obtained polycrystalline ITO thin films exhibit volume resistivity of 416 μΩcm, electron mobility 28 cm 2 /V·s, carrier density 5.3 × 10 20 cm −3 and average optical transmittance above 85% in visible range of spectrum.
chemistry, multidisciplinary,materials science,crystallography
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