Characterization of nanocrystalline indium tin oxide thin films prepared by ion beam sputter deposition method

S. Venkatachalam,Hiroshi Nanjo,Fathy M.B. Hassan,Kazunori Kawasaki,Mitsuhiro Kanakubo,Takafumi Aizawa,Tsutomu Aida,Takeo Ebina

DOI: https://doi.org/10.1016/j.tsf.2010.07.034

IF: 2.1

2010-09-01

Thin Solid Films

Abstract:Indium tin oxide (ITO) thin films were deposited on glass substrates by ion beam sputter deposition method in three different deposition conditions [(i) oxygen (O2) flow rate varied from 0.05 to 0.20sccm at a fixed argon (1.65sccm) flow rate, (ii) Ar flow rate changed from 1.00 to 1.65sccm at a fixed O2 (0.05sccm) flow rate, and (iii) the variable parameter was the deposition time at fixed Ar (1.65sccm) and O2 (0.05sccm) flow rates]. (i) The X-ray diffraction (XRD) patterns show that the ITO films have a preferred orientation along (400) plane; the orientation of ITO film changes from (400) to (222) direction as the O2 flow rate is increased from 0.05 to 0.20sccm. The optical transmittance in the visible region increases with increasing O2 flow rate. The sheet resistance (Rs) of ITO films also increases with increasing O2 flow rate; it is attributed to the decrease of oxygen vacancies in the ITO film. (ii) The XRD patterns show that the ITO film has a strong preferred orientation along (222) direction. The optical transmittance in the visible spectral region increases with an increase in Ar flow rate. The Rs of ITO films increases with increasing Ar flow rate; it is attributed to the decrease of grain size in the films. (iii) A change in the preferred orientations of ITO films from (400) to (222) was observed with increasing film thickness from 314 to 661nm. The optical transmittance in the visible spectral region increases after annealing at 200°C. The Rs of ITO film decreases with the increase of film thickness.

materials science, multidisciplinary,physics, applied, condensed matter, coatings & films