Investigation of optoelectronic properties of tin-doped indium oxide thin films and contact resistivity with silver film: Role of oxygen concentration variation during sputter deposition

Shahnawaz Alam,Ashutosh Pandey,Shrestha Bhattacharya,Sourav Mandal,Vamsi Krishna Komarala
DOI: https://doi.org/10.1016/j.tsf.2024.140398
IF: 2.1
2024-05-30
Thin Solid Films
Abstract:We have investigated the optoelectronic properties like carrier concentration (N ITO ), mobility (μ ITO ), work function (φ ITO ), optical transmission and constants, and sheet resistance (R sh ) of tin-doped indium oxide (ITO) films with the variations in the oxygen flow rate during reactive sputter deposition with the Ar:O 2 plasma. Initially, we also analyzed the generated Ar:O 2 plasma parameters (ion energy and density, electron temperature, and energy distribution) using the Langmuir probe. The ITO films' optoelectronic properties were investigated systematically in as-deposited and annealed (150 to 200°C) conditions with varying O 2 flow rates. By varying the O 2 flow rate, we observed the carrier mobility (μ ITO ) of the ITO films in the range of 31- 47 cm2/V-s, carrier concentration (N ITO ) in the range of 2.16 × 10 19 - 5.22 × 10 20 cm −3 , and resistivity in the range of 3.57 × 10 −4 - 8.95 × 10 −4 Ω-cm. We were able to separate the roles of grain boundary and ionized impurity scatterings in modifying μ ITO as a function of N ITO in the ITO films. Finally, using the transfer length method, we observed a contact resistivity of ∼3 mΩ-cm2 from the ITO/Ag interface at the N ITO of ∼4.08 × 10 20 cm −3 .
materials science, multidisciplinary,physics, applied, condensed matter, coatings & films
What problem does this paper attempt to address?