Preparation and Properties of Indium Tin Oxide Films Deposited by Reactive Evaporation at Different Deposited Rate

LI Lin-na,SUN Jian,XUE Jun-ming,LI Yang-xian,ZHAO Ying,GENG Xin-hua
DOI: https://doi.org/10.3321/j.issn:1005-0086.2007.01.007
2007-01-01
Abstract:Indium-tin oxide(ITO) that has unique characteristics of good conductivity and high light tranmission over the visible spectrum is widely used as the transparent conducting electrode to solar cells and optoelectronic devices.The indium tin oxide(ITO) films have been prepared on glass substrates by reactive evaporation of In-Sn alloy in a system with an oxygen pressure of 1.4×10 -1 Pa and a substrate temperature of 160 ℃.In this research,the deposition rate is in the range from 0.1 to 0.6 A·sec -1 .The electrical resistivity of ITO films is in the range from 4.7×10 -4 to 4.2×10 -3 Ω·cm.The carrier concentration is between 1.3×10 20 and 1.91×10 21 cm -3 ,and the hall mobility is between 10.7 and 28.9 cm2v -1 s -1 .The influence of deposition rate on structural,optical and electrical properties of the obtained films has been investigated.
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