Synchrotron Radiation Photoemission Study of the Electronic Structure of the Ultrathin K/AIN Interface

G. V. Benemanskaya,S. N. Timoshnev,G. N. Iluridze,T. A. Minashvili
DOI: https://doi.org/10.1134/s1063782623090051
IF: 0.66
2024-03-15
Semiconductors
Abstract:The electronic structure of the clean AlN surface and the ultrathin K/AIN interface has been studied in situ by synchrotron-based photoelectron spectroscopy using the photon energies in the range of 100–650 eV The effect of K adsorption was studied. Changes in the valence band and in the Al 2 p , N 1 s , and K 3 p core levels spectra have been investigated using K submonolayer deposition. Modification of the surface electronic structure of the AlN caused by K adsorption is found to originate from the local interaction of N surface atoms and K adatoms. As a results the suppression of intrinsic surface state and appearance of a new induced state are observed. It was found the K-induced electron redistribution effect that causes the positive energy shift of N 1s surface peak and increasing N-ionicity.
physics, condensed matter
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