Abstract:Diamond coatings were deposited on silicon (100) substrate using the microwave plasma chemical vapour deposition (MPCVD) technique at different process conditions. Process parameters such as CH4–H 2 gas mixture concentration, microwave power, chamber pressure and substrate temperature were varied. The diamond coatings were characterized by micro-Raman and micro-photoluminescence (PL) spectroscopy techniques. In this paper we report a comparison of the overall quality of MPCVD polycrystalline diamond coatings grown under different processing conditions in terms of stress distribution, thickness uniformity and surface roughness. Micro-Raman spectroscopy studies over various points on the deposited coating showed that the Raman line widths of diamond peak varied from 3.2 to 18.3 cm−1 with the variation of CH4 and H2 gas concentration. The micro-PL spectra suggested the presence of impurity concentration and defects within the diamond coating synthesized at different processing conditions. Transmission electron microscopy (TEM) images provide the direct evidence of the presence of crystal defects which corroborates the Raman and PL results. The coherence scanning interferometry (CSI) showed that surface roughness of diamond coating varied from 0.43 to 11 μm with thickness at different positions of the three coating samples. It has been concluded that Raman line-width broadening and Raman-shift are due to the presence of crystal defects as well as non-uniform distribution of stresses present in the diamond crystals of the coating, due to the incorporation of Si as impurity element and non-uniform temperature distribution during growth. Defect density gets reduced at higher processing temperatures. It is also being proposed that better thickness uniformity and lower surface roughness can be achieved for coatings deposited at low methane concentration under optimized process conditions.

Investigation on growth rate and quality of diamond materials in MPCVD system

An innovative gas inlet design in a microwave plasma chemical vapor deposition chamber for high-quality, high-speed, and high-efficiency diamond growth

High-speed growth of high-quality polycrystalline diamond films by MPCVD

Nitrogen Adsorption Induced Surface Kinetics Changes of Diamond Growth by Microwave Plasma Cvd

Origin,characteristics,and Suppression of Residual Nitrogen in MPCVD Diamond Growth Reactor

Homoepitaxy Growth of Single Crystal Diamond under 300 torr Pressure in the MPCVD System

Recent progress in homoepitaxial single-crystal diamond growth via MPCVD

Effect of pressure on nanocrystalline diamond films deposition by hot filament CVD technique from CH4/H2 gas mixture

Enhanced Growth Of High Quality Single Crystal Diamond By Microwave Plasma Assisted Chemical Vapor Deposition At High Gas Pressures

Very high growth rate chemical vapor deposition of single-crystal diamond.

Fast, Efficient Tailoring Growth of Nanocrystalline Diamond Films by Fine-Tuning of Gas-Phase Composition Using Microwave Plasma Chemical Vapor Deposition

Single crystal diamond growth by MPCVD at subatmospheric pressures

The Growth And Interface Characteristics Of Diamond Films On Cemented Carbide Substrates

[Optical Spectroscopy for High-Pressure Microwave Plasma Chemical Vapor Deposition of Diamond Films]

Investigation of diamond deposition on the diamond, silicon and quartz substrates by microwave plasma chemical vapor deposition and Monte Carlo simulations

Effect of methane flow rate on gas-jet MPCVD diamond synthesis

Effect of Nitrogen on Growth and Optical Properties of Single-Crystal Diamond Synthesized by Chemical Vapor Deposition

Microscopic properties of MPCVD diamond coatings studied by micro-Raman and micro-photoluminescence spectroscopy

Study on the Simulation and Experimental Impact of Substrate Holder Design on 3-Inch High-Quality Polycrystalline Diamond Thin Film Growth in a 2.45 GHz Resonant Cavity MPCVD

Effect of Input Power on the Deposition of Optical Grade Thick Diamond Film in A Dcpj Cvd Jet System

Growth of diamond microchannels on micro-grooved graphite substrate by MPCVD