Abstract:Aerosol jet printing (AJP) is a promising noncontact direct ink writing technology that enables flexible and conformal electronic devices to be fabricated onto planar and nonplanar substrates with higher resolution and less waste. Despite possessing many advantages, the limited electrical performance of microelectronic devices caused by the poor printing quality is still the greatest hurdle to overcome for AJP technology. With the motivation to improve the printing quality, a novel hybrid machine learning method is proposed to analyze and optimize the AJP process based on the deposited droplet morphology in this study. The proposed method consists of classic machine learning approaches, including space-filling-based experimental design, clustering, classification, regression, and multiobjective optimization. In the proposed method, a two-dimensional (2D) design space is fully explored using a Latin hypercube sampling approach for experimental design, and a K-means clustering approach is employed to reveal the cause-effect relationship between the deposited droplet morphology and printed line characteristics. Following that, an optimal operating window with respect to the deposited droplet morphology is identified using a support vector machine to ensure the printing quality in a design space. Finally, to achieve high-controllability and sufficient-thickness droplets, Gaussian process regression is adopted to develop the process model of droplet geometrical properties, and the deposited droplet morphology is optimized under dual conflicting objectives of customizing the droplet diameter and maximizing droplet thickness. Different from previous printing quality optimization approaches, the proposed method enables a systemic investigation on the formation mechanisms of printed line characteristics, and the printing quality is fundamentally optimized based on the deposited droplet morphology. Moreover, data-driven-based characteristics can help the proposed approach serve as a guideline for printing quality optimization in other noncontact direct ink writing technologies.

Machine learning in electron beam lithography to boost photoresist formulation design for high-resolution patterning

Process Optimization of Line Patterns in Extreme Ultraviolet Lithography Using Machine Learning and a Simulated Annealing Algorithm.

Machine Learning Applied to Electron Beam Lithography to Accelerate Process Optimization of a Contact Hole Layer

Convolutional Neural Network-Assisted Photoresist Formulation Discriminator Design of a Contact Layer for Electron Beam Lithography

Machine Learning Enables Process Optimization of Aerosol Jet 3D Printing Based on the Droplet Morphology.

Process optimization of contact hole patterns via a simulated annealing algorithm in extreme ultraviolet lithography

Computational Lithography Using Machine Learning Models

Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist

Automated Lithography Resolution Enhancement with Deep Learning Enabled Layout Modification During Physical Design Stage

Canny Algorithm Enabling Precise Offline Line Edge Roughness Acquisition in High-Resolution Lithography.

Advanced lithography materials: From fundamentals to applications

Quantitative evaluation of residual resist in electron beam lithography based on scanning electron microscopy imaging and thresholding segmentation algorithm

Towards smart scanning probe lithography: a framework accelerating nano-fabrication process with in-situ characterization via machine learning

Photoresist Process Simulation to Study Line Edge Roughness

Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da)

Design and Optimization of Resist Film in Imprint Lithography Alignment Process

Critical Dimension Prediction of Metal Oxide Nanoparticle Photoresists for Electron Beam Lithography Using a Recurrent Neural Network.

Predicting the critical features of the chemically-amplified resist profile based on machine learning

Physical model-based ArF photoresist formulation development

Generic Lithography Modeling with Dual-band Optics-Inspired Neural Networks

Machine Learning for Yield Learning and Optimization