Automated Lithography Resolution Enhancement with Deep Learning Enabled Layout Modification During Physical Design Stage

Zixi Liu,Yibo Lin,Xiaojing Su,Xiaohuan Ling,Xin Hong,Bojie Ma,Yajuan Su,Yayi Wei
DOI: https://doi.org/10.1145/3649476.3658802
2024-01-01
Abstract:Lithography compliance is critical to the manufacturability of modern integrated circuits. Applying resolution enhancement techniques like OPC and ILT at sign-off stages is too late and can only make minor layout adjustment, which has limited optimization space to improve printability in advanced technology nodes. To explore larger optimization space, we propose an automated lithography resolution enhancement framework that targets to improve lithography process window by layout modification during early design stages like physical design. The framework simultaneously adjusts layout patterns towards lithography compliance, and meanwhile subjecting to design rules and connectivity constraints. Experimental results demonstrate that our framework can enable efficient layout optimization and achieve an average of 5.69% improvement in lithography process window.
What problem does this paper attempt to address?