Thermal radiative near field transport between vanadium dioxide and silicon oxide across the metal insulator transition

F. Menges,M. Dittberner,L. Novotny,D. Passarello,S. S. P. Parkin,M. Spieser,H. Riel,B. Gotsmann
DOI: https://doi.org/10.1063/1.4948364
IF: 4
2016-04-25
Applied Physics Letters
Abstract:The thermal radiative near field transport between vanadium dioxide and silicon oxide at submicron distances is expected to exhibit a strong dependence on the state of vanadium dioxide which undergoes a metal-insulator transition near room temperature. We report the measurement of near field thermal transport between a heated silicon oxide micro-sphere and a vanadium dioxide thin film on a titanium oxide (rutile) substrate. The temperatures of the 15 nm vanadium dioxide thin film varied to be below and above the metal-insulator-transition, and the sphere temperatures were varied in a range between 100 and 200 °C. The measurements were performed using a vacuum-based scanning thermal microscope with a cantilevered resistive thermal sensor. We observe a thermal conductivity per unit area between the sphere and the film with a distance dependence following a power law trend and a conductance contrast larger than 2 for the two different phase states of the film.
physics, applied
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