Control of ZIF‐62 and agZIF‐62 Film Thickness within Asymmetric Tubular Supports through Pressure and Dose Time Variation of Atomic Layer Deposition

Dana M. Stone,Sarah E. Morgan,Mai O. Abdelmigeed,Jimmy Nguyen,Thomas D. Bennett,Gregory N. Parsons,Matthew G. Cowan
DOI: https://doi.org/10.1002/smll.202307202
IF: 13.3
2024-02-04
Small
Abstract:Control of localized metal organic film thickness is shown through the variation of chamber pressure and dose time during atomic layer deposition (ALD). Zinc oxide is deposited within α‐alumina tubular supports, solvothermally converted to zeolitic imidazole framework‐62 (ZIF‐62), and subsequently melt treated into an amorphous glass (agZIF‐62). Through variation of the ALD conditions, the ZIF‐62 films are reduced from 38 μm to 16 μm, while the agZIF‐62 films are reduced from 16 to 2 μm. Thin‐films of metal‐organic frameworks (MOFs) have widespread potential applications, especially with the emergence of glass‐forming MOFs, which remove the inherent issue of grain boundaries and allow coherent amorphous films to be produced. Herein, it is established that atomic layer deposition (ALD) of zinc oxide lends excellent control over the thickness and localization of resultant polycrystalline and glass zeolitic imidazole framework‐62 (ZIF‐62) thin‐films within tubular α‐alumina supports. Through the reduction of the chamber pressure and dose times during zinc oxide deposition, the resultant ZIF‐62 films are reduced from 38 μm to 16 μm, while the presence of sporadic ZIF‐62 (previously forming as far as 280 μm into the support) is prevented. Furthermore, the glass transformation shows a secondary reduction in film thickness from 16 to 2 μm.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
What problem does this paper attempt to address?