Impact of Device Parameters on the Performance of $\beta $-Ga$_{\text{2}}$OTEXPRESERVE2 Nanomembrane MESFETs

Anumita Sengupta,Ashvinee Deo Meshram,Tarun Kanti Bhattacharyya,Gourab Dutta
DOI: https://doi.org/10.1109/ted.2024.3367317
IF: 3.1
2024-01-01
IEEE Transactions on Electron Devices
Abstract:In this study, we have systematically investigated the impact of intrinsic device parameters on the performance of beta gallium oxide ( $\beta $ -Ga2O3) nanomembrane metal–semiconductor field effect transistors (NM-MESFETs). The ON- and OFF-state performances of these devices were analyzed using a well-calibrated technology computer-aided design (TCAD) simulator, focusing on breakdown voltage ${(} {V}_{\text {BR}} {)}$ , ON-resistance ( ${R}_{\text {ON}}{)}$ , threshold voltage ${(} {V}_{\text {th}} {)}$ , maximum drain current ${(} {I}_{\text {D},\text {max}} {)}$ , and power figure of merit ${(} \text {PFOM} {)}$ . Two distinct breakdown mechanisms are identified, significantly affecting ${V}_{\text {BR}}$ of these NM-MESFETs. Interestingly, when studying the effect of individual device parameters on ${V}_{\text {BR}}$ , we observed an initial increasing trend up to a critical value, followed by a sharp fall and a subsequent decreasing trend. Through simulations, an empirical model is developed that facilitates the selection of appropriate device parameters to achieve MESFETs with high ${V}_{\text {BR}}$ . In addition, an analytical model of ${V}_{\text {th}}$ of the MESFET in terms of its device parameters is also proposed and validated with simulation results. The performance of the NM devices is also benchmarked against reported Ga2O3 devices.
engineering, electrical & electronic,physics, applied
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