Performance Analysis of Boron Nitride Embedded Armchair Graphene Nanoribbon MOSFET with Stone Wales Defects

Anuja Chanana,Amretashis Sengupta,Santanu Mahapatra
DOI: https://doi.org/10.1063/1.4862311
2013-09-24
Abstract:We study the performance of a hybrid Graphene-Boron Nitride {GNR-BN} armchair nanoribbon {a-GNR-BN} MOSFET at its ballistic transport limit. We consider three geometric configurations 3p, 3p+1 and 3p+2 of a-GNR-BN with BN atoms embedded on both sides {2, 4 and 6 BN on each side} on the GNR. The material properties like band gap, effective mass and density of states of these H-passivated structures have been evaluated using the Density Functional Theory {DFT}. Using these material parameters, self-consistent Poisson-Schrodinger simulations are carried out under the Non Equilibrium Greens Function {NEGF} formalism to calculate the ballistic MOSFET device characteristics. For a hybrid nanoribbon of width ~ 5 nm, the simulated ON current is found to be in the range 276 uA - 291 uA with an ON/OFF ratio 7.1 x 10^6 - 7.4 x 10^6 for a VDD = 0.68 V corresponds to 10 nm technology node. We further study the impact of randomly distributed Stone Wales {SW} defects in these hybrid structures and only 2.52% degradation of ON current is observed for SW defect density of 6.35%.
Mesoscale and Nanoscale Physics
What problem does this paper attempt to address?
The problem that this paper attempts to solve is: How to improve the performance of MOSFET at the 10 - nanometer technology node by introducing boron - nitride (BN) - embedded armchair graphene nanoribbon (a - GNR), especially in the presence of Stone - Wales defects. Specifically, the research focuses on the following aspects: 1. **Analysis of material properties**: - Calculate material properties such as band gap, effective mass, and density of states of a - GNR - BN hybrid nanoribbons with different geometric configurations (3p, 3p + 1, 3p + 2) through density functional theory (DFT). - Use the non - equilibrium Green's function (NEGF) method for self - consistent Poisson - Schrödinger simulations to evaluate the influence of these material parameters on the performance of MOSFET devices. 2. **Evaluation of device performance**: - Calculate and analyze the output characteristics of MOSFETs under different configurations, such as \(I_D - V_D\), \(I_D - V_G\), transconductance \(g_m - V_G\), cutoff frequency, \(I_{ON}/I_{OFF}\) ratio, drain - induced barrier lowering (DIBL), and subthreshold slope (SS). - Study the device performance under pure ballistic transport conditions when the channel length is 10 nanometers. 3. **Study of defect influence**: - By introducing randomly distributed Stone - Wales defects, study their influence on the performance of hybrid nanoribbon MOSFETs. In particular, explore the influence on the on - state current (ON current) when the defect density is 6.35%, and find that only 2.52% degradation is observed. In summary, this paper aims to explore the potential of BN - embedded a - GNR as a MOSFET channel material at the 10 - nanometer technology node and evaluate its performance stability in the presence of structural defects.