The role of Si on the structure and tribological properties of a-C:H:Ni soft films at elevated temperatures

Yanxia Wu,Xu Jiang,Bang Shi,Ke Li,Ying Liu,Shengwang Yu,Bing Zhou,Ke Zheng
DOI: https://doi.org/10.1016/j.wear.2024.205298
IF: 4.695
2024-02-17
Wear
Abstract:Si was doped into a-C:H:Ni film by radio frequency magnetron sputtering to improve its tribological properties at elevated temperatures from 25 to 300 °C. The structure, morphology, mechanical and tribological properties were investigated. The results showed that doped Si facilitated sp 2 -to-sp 3 rehybridization, decreased H content, improved hardness, adhesion strength, higher structural stability and tribological properties. Notably, the a-C:H:Ni:Si-2 film (with Si content of 5.92 at.%) showed relatively better mechanical and tribological properties. The wear mechanism changed from ploughing accompanied by abrasive wear at 25 °C to adhesive wear at higher temperatures, which was closely related to increased sp 3 -to-sp 2 rehybridization in the film and changes in the existing form of Si from Si-OH to Si x O y at the counterface.
engineering, mechanical,materials science, multidisciplinary
What problem does this paper attempt to address?