Function of Si on the microstructure, mechanical property and high temperature corrosion resistance of TiAlMoNbWSi x HEA film

Hongxu Zhang,Yimin Liao,Yewang Zhan,Hanlin Chen,Qinqing Zhu,Haojie Chen,Changchun Zhao,Liubin Zheng,Fangfang Wang
DOI: https://doi.org/10.1016/j.matchemphys.2024.129336
IF: 4.778
2024-04-27
Materials Chemistry and Physics
Abstract:TiAlMoNbWSi x (x = 0, 0.3, 0.5, 0.7) HEA films were deposited by magnetron co-sputtering technology to enhance the wear and high-temperature corrosion resistance of the copper. The structure of films was regulated by changing the content of Si to improve the comprehensive properties. The lattice distortion and negative mixing enthalpy change caused by the introduction of Si transformed the film from BCC structure to amorphous. With the increase of Si content, the wear resistance and the oxidation resistance were effectively improved. The characteristic delayed diffusion effect of HEA film allowed all the TiAlMoNbWSi x films to successfully block the diffusion between Zn and Cu.
materials science, multidisciplinary
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