Field Emission Properties of Top–Down GaN Nanowires Characterized in Vacuum by a Nanometer-Resolution Piezoelectric Probing System

G. Doundoulakis,D. Pavlidis
DOI: https://doi.org/10.1007/s11664-023-10894-w
IF: 2.1
2024-01-17
Journal of Electronic Materials
Abstract:Gallium nitride (GaN) nanowire (NW) vacuum field emission (FE) devices are promising candidates for next generation devices, as they are expected to combine the advantageous features of solid-state devices with those of vacuum electronics. The performance of these devices relies on NW formation with well-defined cylindrical shape and minimum surface damage, while their accurate evaluation requires nanometer-resolution probing. To address the latter, top–down GaN NW FE devices with an integrated leveling structure were fabricated and their characteristics are reported. A custom-made vacuum characterization system with a 1-mm-diameter cylindrical piezoelectrically actuated probe with nanometer-resolution, served as the anode of the FE device, in the characterization system used for studying the GaN NW FE devices. The fabricated FE devices exhibited a maximum current density of ~ 1.0 A/cm2 and a turn-on voltage of ~ 85 V, using a total number of 22,500 NWs with 160 nm diameter and a ~ 2-μm anode to NW separation distance. Further improvement of the technology could enable the exploitation of the piezoelectric system for probing with nanometer-scale vertical resolution FE devices with closely spaced anode to cathode configurations. This characterization system and the proposed process flow can also be adopted for the nanometer-resolution piezoelectric probing of different semiconductor NW materials, providing an easy and cost-effective way of FE measurements of vertical NWs.
engineering, electrical & electronic,materials science, multidisciplinary,physics, applied
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