Inhibitor, co-catalyst, or intermetallic promoter? Probing the sulfur-tolerance of MoOx surface decoration on Ni/SiO2 during methane dry reforming
Xupeng Liu,Junkai Yan,Jing Mao,Dedong He,Shuang Yang,Yi Mei,Yongming Luo
DOI: https://doi.org/10.1016/j.apsusc.2021.149231
IF: 6.7
2021-05-01
Applied Surface Science
Abstract:<p>As for the application of CH<sub>4</sub> dry reforming (DRM), primary concern was focused on solving the deactivation of supported Ni catalysts caused by particle sintering and coke accumulation, while little attention has been paid to negative effect resulted from sulfur poisoning. The present work gave an account of the effect of H<sub>2</sub>S on the DRM over MoO<sub>x</sub> decorated Ni/SiO<sub>2</sub> catalyst. It showed that Mo modified samples presented better sulfur resistance performance. Moreover, the interesting discovery was that different forms of Mo species were worked as special roles during H<sub>2</sub>S-induced DRM. The suitable amount of Mo, involved as the inhibitor and/or the co-catalyst, could increase the competitive adsorption capacity for H<sub>2</sub>S, thus slowing down sulfuration rate of the active Ni sites. Meanwhile, as for the specially pre-reduced catalysts, the formed intermetallic metal of Ni-Mo component contributed to a continuous sulfur-adsorption behavior for H<sub>2</sub>S, thus protecting the active Ni sites from sulfuration. Consequently, probing the sulfur-tolerance of MoO<sub>x</sub> surface decoration on Ni/SiO<sub>2</sub> could elucidate some useful keys for the development of high sulfur-resistance catalysts, which, as a consequence, would be adequate catalysts for the H<sub>2</sub>S-induced DRM process.</p>
chemistry, physical,physics, applied, condensed matter,materials science, coatings & films