Research on single event effects and hardening design of LDMOS transistors

Ying Wang,Wei Zhou,Ling Peng,Fei Chu,Zongmin Wang,Ying Kong,Guicai Hu and Yifan Hu
DOI: https://doi.org/10.35848/1347-4065/ad6b6b
IF: 1.5
2024-08-27
Japanese Journal of Applied Physics
Abstract:In this paper, an N-type Lateral Diffused Metal Oxide Semiconductor (LDMOS) device was designed using a heavily doped P+ well and drain N-type buffer layer structure in the BCD process. The hardened mechanism of heavily doped P+ well and drain N-type buffer layer structures was simulated and analyzed using a TCAD device simulator. To verify the anti-SEE performance of the LDMOS, the irradiation test was conducted using Ta ion (LET = 79.2 MeV·cm−2 mg−1). The results show that increasing P+ well doping concentration and using buffer layer structure can increase the single event burnout (SEB) voltage of high-voltage LDMOS devices. SEB did not occur within the full operation voltage range.
physics, applied
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