Direct laser patterning of glass mask for micro display using GHz bursts

Woohyun Jung,Hyungsik Kim,Konstantin Mishchik,Kisang Lee,Jekil Ryu,Seung Joo Lee,Seong Ho Jeong,Cheol Lae Roh
DOI: https://doi.org/10.1002/jsid.1308
2024-05-11
Journal of the Society for Information Display
Abstract:In this study, we implemented alumino‐boro‐silicate glass micro‐drilling using IR‐fs optical system operating in MHz and GHz burst modes, aiming to contribute to the manufacturing of high precise ultra‐fine mask (UFM) using thin glass platform. The array of fine holes with aspect ratio of 1:10 is produced at 5μm pitch for 0.6 inch area with no heat‐induced glass damage. Development of high‐precision RGB patterning process is needed to implement high‐resolution micro display (OLEDoS) for next‐generation VR/AR products. In general, specially designed and manufactured masks are required to realize above 3000‐ppi high‐resolution display in structured OLED material deposition. In this study, we developed direct laser patterning IR‐fs optical system operating in MHz and GHz burst modes and evaluated its capability for precise micro‐drilling of aluminoborosilicate glass materials. The fine hole‐shaped pattern is produced at a minimum of 5 μm pitch level for about 0.6 in. area without sacrificing the glass strength. It is expected to contribute to the high precise manufacture of ultra fine mask (UFM) using thin glass platform corresponding to micro displays in the future.
engineering, electrical & electronic,materials science, multidisciplinary,optics,physics, applied
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