Direct Femtosecond Laser Nanopatterning of Glass Substrate by Particle-Assisted Near-Field Enhancement

Y Zhou,MH Hong,JYH Fuh,L Lu,BS Luk'yanchuk,ZB Wang,LP Shi,TC Chong
DOI: https://doi.org/10.1063/1.2163988
IF: 4
2006-01-01
Applied Physics Letters
Abstract:Direct femtosecond laser nanopatterning of glass substrate by particle-assisted near-field enhancement was demonstrated in this letter. The nanostructure was characterized by field-emission scanning electron microscopy and atomic force microscopy. No cracks were found on the glass surface. The hole size were measured from 200∼300nm. When laser fluence is close to the damage threshold, a trihole structure was observed. Nonlinear multiphoton absorption and near-field enhancement were the mechanisms of the nanofeature formation. Calculations based on particle-on-surface theory were carried out. The suggested method has potential applications in the nanolithography of a transparent glass substrate for nanostructure device fabrication.
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