A high gain-flatness C-band variable gain LNA in a 0.25 μm GaAs pHEMT process

Dengbao Sun,Cong Zhou,Guodong Su,Zengda Wang,Xiang Wang,Jun Liu
DOI: https://doi.org/10.1016/j.mejo.2024.106117
IF: 1.992
2024-02-02
Microelectronics Journal
Abstract:This paper presents a C-band (4–8 GHz) transconductance-controlled variable gain low noise amplifier (G m -VGLNA) with excellent gain-flatness. The impedance and gain of the improved amplifier-cell (IA) are analyzed, and a current-controlled E-mode pHEMT load (CEL) structure is proposed to improve the gain-flatness performance in a wideband frequency range. The G m -VGLNA is designed and fabricated using a 0.25 μm GaAs pHEMT process. The measured results demonstrate a gain range of 11.5 dB, a return loss better than −8.3 dB over the operating frequency range, and a minimum noise figure of 2 dB. The best gain-flatness achieved is ±0.22 dB while the small signal gain is 15.2 dB, with gain-flatness better than ±0.78 dB over the entire operating gain range.
engineering, electrical & electronic,nanoscience & nanotechnology
What problem does this paper attempt to address?