Highly c -axis-oriented apatite-type lanthanum silicate thin films fabricated by magnetron sputtering under bias

Shigekazu Hidaka,Kenji Takagi,Takahisa Yamamoto
DOI: https://doi.org/10.1016/j.matchemphys.2024.129852
IF: 4.778
2024-08-23
Materials Chemistry and Physics
Abstract:The development of apatite-type lanthanum silicate (LSO) thin films with enhanced c -axis orientation has received attention because highly c -axis oriented LSO is an attractive electrolyte for lowering the operating temperature of solid oxide cells. In this study, the effect of thin-film conditions in magnetron sputtering on the c -axis orientation of LSO thin films after crystallization were investigated. X-ray diffraction and X-ray reflectivity measurements revealed that the c -axis orientation of LSO thin films after crystallization is correlated with the density of the amorphous thin films deposited by magnetron sputtering. Bias application during magnetron sputtering effectively increased the c -axis orientation of crystallized LSO thin films, which showed extremely high c -axis orientation (Lotgering factor of 0.99). This thin film consisted of columnar grains, most of which were c -axis oriented, as confirmed by direct observation using scanning transmission electron microscopy.
materials science, multidisciplinary
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