High-performance n-type transistors based on CVD-grown large-domain trilayer WSe 2

Xin Wang,Xinhang Shi,Chengru Gu,Qi Guo,Honggang Liu,Xuefei Li,Yanqing Wu
DOI: https://doi.org/10.1063/5.0048983
IF: 6.6351
2021-07-01
APL Materials
Abstract:Atomically thin layered tungsten diselenide (WSe<sub>2</sub>) has attracted tremendous research attention for its potential applications in next-generation electronics. This article reports the synthesis method of high-quality monolayer to trilayer WSe<sub>2</sub> by molten-salt-assisted chemical vapor deposition. With the optimization of different types of molten salts and depths of corundum boat, large trilayer WSe<sub>2</sub> films can be grown with domain size up to 80 <i>µ</i>m for the first time. A systematic study of the electrical properties of the <i>n</i>-type field-effect transistor has been carried out based on WSe<sub>2</sub> with the above three different layer thicknesses. The trilayer WSe<sub>2</sub> devices exhibit higher drive current, mobility, on/off ratio, and lower contact resistance than both bilayer and monolayer counterparts. Moreover, short channel transistors using the trilayer WSe<sub>2</sub> with a channel length of 230 nm have been fabricated, exhibiting an excellent on/off ratio up to 10<sup>8</sup> and a high current density of 187 <i>µ</i>A/<i>μ</i>m. This facile synthesis of high-quality large-area multilayer WSe<sub>2</sub> provides a pathway for future high-performance two-dimensional electronic devices.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
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