NbN thin films grown on silicon by molecular beam epitaxy for superconducting detectors

A. Iovan,A. Pedeches,T. Descamps,H. Rotella,I. Florea,F. Semond,V. Zwiller
DOI: https://doi.org/10.1063/5.0175699
IF: 4
2023-12-18
Applied Physics Letters
Abstract:Superconducting nanowire single photon detectors (SNSPDs) made with thin NbN films can reach high performances. While sputtering has been the deposition method of choice, here, we show that ammonia-molecular beam epitaxy (NH3-MBE) can produce pertinent epitaxial cubic NbN thin films on silicon substrates using an AlN buffer. Despite granular morphology and a high density of grain boundaries as well as the presence of rotational twins, Tc = 12.7 K for a 5.6 nm thick film and saturation of internal detection efficiency up to 850 nm are achieved. Morphology and stoichiometry as well as strain have a strong impact on the detector properties, highlighting the importance of a precise control of the growth parameters. These results pave the way for high fabrication yield of SNSPDs on large-scale silicon wafers using epitaxial NbN thin films grown by MBE.
physics, applied
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