High performance near-infrared MoTe2/Ge heterojunction photodetector fabricated by direct growth of Ge flake on MoTe2 film substrate

Wenyu Lei,Xiaokun Wen,Guowei Cao,Li Yang,Pengzhen Zhang,Fuwei Zhuge,Haixin Chang,Wenfeng Zhang
DOI: https://doi.org/10.1063/5.0103018
IF: 4
2022-08-24
Applied Physics Letters
Abstract:We demonstrated a feasible strategy to fabricate MoTe 2 /Ge heterojunction by direct growth of Ge flake on a MoTe 2 film substrate with a two-step chemical vapor deposition method. A thin transition layer (∼4 nm) mainly composed of polycrystalline germanium at the MoTe 2 /Ge interface was verified during the Ge flake growth. The MoTe 2 /Ge heterojunction-based photodetector exhibits both the response speed with a rise/fall time of 7/4 μ s and the photoresponsivity and detectivity with 4.87 A W −1 and 5.02 × 10 11 Jones under zero bias in the near-infrared regime, respectively. The characteristics of device performance imply its practical applicability as building block for potential near-infrared integrated photonics.
physics, applied
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