Temperature-Dependent Ferroelectric Behaviors of AlScN-Based Ferroelectric Capacitors with a Thin HfO2 Interlayer for Improved Endurance and Leakage Current

Hyeong Jun Joo,Si Sung Yoon,Seung Yoon Oh,Yoojin Lim,Gyu Hyung Lee,Geonwook Yoo
DOI: https://doi.org/10.3390/electronics13224515
IF: 2.9
2024-11-27
Electronics
Abstract:The ferroelectric switching behavior of a metal–ferroelectric AlScN–HfO2 interlayer–metal (MFIM) capacitor was investigated at variable temperatures and compared with an MFM capacitor. Although the MFIM capacitor demonstrated an inferior remnant polarization (2Pr value of 74 μC/cm2), it exhibited a reduced leakage current (×1/100) and higher breakdown field. The MFIM showed a stable change in 2Pr from room temperature to 200 °C and an enhanced endurance of ~104 cycles at 200 °C; moreover, the leakage current was less degraded after the cycling tests. Thus, the ferroelectric AlScN with a thin HfO2 interlayer can enhance the reliability of ferroelectric switching.
engineering, electrical & electronic,computer science, information systems,physics, applied
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