Nanoparticle assembly by transient topography induced by applying soft lithography to block copolymer films

Meneka Banik,Roy Shenhar
DOI: https://doi.org/10.1039/d4sm00234b
IF: 4.046
2024-05-01
Soft Matter
Abstract:We present a simple approach for patterning metal nanoparticles into periodic superstructures on flat films spanning centimeter-square areas. Our approach is based on capillary force lithography, a soft lithography method that is used to impart topography to softened polymer films, and applies it to block copolymer films to obtain substrates featuring both topographic and chemical contrasts that can serve as templates for the selective deposition of nanoparticles. Here we show that flattening the films by exposure to solvent vapour before nanoparticle deposition not only retains chemical heterogeneity but also provides access to unique hierarchically-organized nanoparticle superstructures that are unattainable by other methods. Such structures could be useful for optical, sensor, and catalytic applications.
polymer science,chemistry, physical,materials science, multidisciplinary,physics
What problem does this paper attempt to address?