A Novel Approach for Colloidal Lithography: From Dry Particle Assembly to High-Throughput Nanofabrication

Sivan Tzadka,Carlos Ureña Martin,Esti Toledo,Abed Al Kader Yassin,Ashish Pandey,Guillaume Le Saux,Angel Porgador,Mark Schvartzman
DOI: https://doi.org/10.1021/acsami.3c18554
IF: 9.5
2024-03-30
ACS Applied Materials & Interfaces
Abstract:We introduce a novel approach for colloidal lithography based on the dry particle assembly into a dense monolayer on an elastomer, followed by mechanical transfer to a substrate of any material and curvature. This method can be implemented either manually or automatically and it produces large area patterns with the quality obtained by the state-of-the-art colloidal lithography at a very high throughput. We first demonstrated the fabrication of nanopatterns with a periodicity ranging between 200...
materials science, multidisciplinary,nanoscience & nanotechnology
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