Light and Matter Co-Confined Multi-Photon Lithography
Lingling Guan,Chun Cao,Xi Liu,Qiulan Liu,Yiwei Qiu,Xiaobing Wang,Zhenyao Yang,Huiying Lai,Qiuyuan Sun,Chenliang Ding,Dazhao Zhu,Cuifang Kuang,Xu Liu
DOI: https://doi.org/10.1038/s41467-024-46743-5
IF: 16.6
2024-01-01
Nature Communications
Abstract:Mask-free multi-photon lithography enables the fabrication of arbitrary nanostructures low cost and more accessible than conventional lithography. A major challenge for multi-photon lithography is to achieve ultra-high precision and desirable lateral resolution due to the inevitable optical diffraction barrier and proximity effect. Here, we show a strategy, light and matter co-confined multi-photon lithography, to overcome the issues via combining photo-inhibition and chemical quenchers. We deeply explore the quenching mechanism and photoinhibition mechanism for light and matter co-confined multiphoton lithography. Besides, mathematical modeling helps us better understand that the synergy of quencher and photo-inhibition can gain a narrowest distribution of free radicals. By using light and matter co-confined multiphoton lithography, we gain a 30 nm critical dimension and 100 nm lateral resolution, which further decrease the gap with conventional lithography.