Synthesis, Characterization of Ceo2@Zif-8 Composite Abrasives and Their Chemical Mechanical Polishing Behavior on Glass Substrate

Hong Lei,Xiaoyue Yuan,Chuandong Chen,Zefang Zhang

DOI: https://doi.org/10.2139/ssrn.4179087

2022-01-01

SSRN Electronic Journal

Abstract:Cerium oxide abrasive can have a unique chemical reaction with silicon oxide, thus providing the most critical support for glass planarization. In this work, a composite abrasive named zeolite imidazolium cerium oxide (CeO2@ZIF-8) was prepared by growing zeolitic imidazolate frameworks material (ZIF-8) material outside a modified cerium oxide particle, and evaluated its polishing properties on glass substrate. Compared with pure ceria abrasive, the material removal rate using CeO2@ZIF-8 composite abrasive (1.95 wt%) is increased by a maximum of 28%, and lower surface roughness of 1.23 nm can be obtained. Results from X-ray photoelectron spectroscopy revealed the increase in the concentration of Ce3+ ion on the CeO2@ZIF-8 composite abrasives surface. The contact angle tests indicated the slurries containing CeO2@ZIF-8 abrasives had a better wettability. As a result, the increasing contact area with the glass substrate and an increase in the concentration of active site Ce3+ synergistically contribute to the more vigorous chemical reaction activity between CeO2@ZIF-8 composite abrasives and glass substrate, bringing superior polishing performance. We believe this work adds valuable insights regarding glass CMP by using CeO2@ZIF-8 as abrasives.