Study on Uniform Size and Spherical Ceo2 Abrasives Synthesized by Two-Step Method and Their Chemical Mechanical Polishing Performances

Ning Xu,Yu Lin,Yuxin Luo,Jiahui Ma,Yu Huo,Kailong Gao,Ziheng Gao,Zhuo Wang

DOI: https://doi.org/10.1016/j.mssp.2024.108920

IF: 4.1

2025-01-01

Materials Science in Semiconductor Processing

Abstract:In this study, the synthesis of CeO2 abrasives by two-step method was studied in detail and compared with one-step method. The micro-morphology, particle size and distribution of abrasives prepared by these two methods were studied. In addition, the chemical mechanical polishing performances of CeO2 abrasives at different calcination temperatures were tested, including key parameters such as material removal rate (MRR) and surface roughness (Ra). The results show that the CeO2 abrasives synthesized by one-step method are mainly spherical and irregular polyhedron, and the particle size is 678.85 nm when the calcination temperature is 800 degrees C. The concentration of oxygen vacancy and Ce3+ is 13.06 % and 20.12 %, respectively. The highest MRR of quartz glass is 651.09 nm/min and the Ra is 0.52 nm. The CeO2 abrasives prepared by two-step method are spherical with uniform particle size distribution, the particle size is 98.72 nm. The concentration of oxygen vacancy and Ce3+ is 18.83 % and 24.97 %, respectively. The highest MRR of quartz glass is 626.97 nm/min and the Ra is 0.1363 nm. Compared with the one-step method, the surface roughness is reduced by 73.79 %. Appropriate abrasives size and uniform particle size distribution can improve the polishing quality of the workpiece. In this paper, it is considered that the two-step method is beneficial to control the morphology and size of CeO2 abrasives, and provides conditions for the preparation of abrasives with uniform particle size distribution and spherical morphology, so as to improve the properties of chemical mechanical polishing materials.