Improved minority carrier lifetime in p-type GaN by suppressing the non-radiative recombination process

shumeng yan,Jianxun Liu,Yu Zhou,Xiujian Sun,Yaozong Zhong,Xin Chen,yongjun Tang,Xiaolu Guo,Qian Sun,hui Yang
DOI: https://doi.org/10.35848/1882-0786/ac749d
IF: 2.819
2022-05-31
Applied Physics Express
Abstract:Time-resolved photoluminescence and capacitance-voltage measurement were performed on p-type GaN and InGaN films to study the minority carrier recombination mechanism. The minority carrier lifetime (τPL) for p-GaN with a Mg concentration of 1.7×1019 cm-3 was 46 ps. The non-radiative recombination due to gallium vacancies (VGa)-related defects is confirmed to dominate the minority carrier transport process. To suppress the formation of VGa defects, the indium atoms were added into p-GaN. As a consequence, the VGa-related non-radiative recombination centers were reduced from 8×1015 to 5×1014 cm-3 and a record long τPL of 793 ps was obtained for p-In0.035Ga0.95N film.
physics, applied
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