Band alignment of monolayer MoS2/4H-SiC heterojunction via first-principles calculations and x-ray photoelectron spectroscopy

Bangyao Mao,Xiurui Lv,Guijuan Zhao,Shu'an Xing,Jinjin Tang,Heyuan Huang,Guipeng Liu,Yong Gao
DOI: https://doi.org/10.1063/5.0094338
IF: 4
2022-08-04
Applied Physics Letters
Abstract:2D/3D heterostructures have received extensive attention due to their unique structures and outstanding properties. In this work, the structural and electronic properties of monolayer MoS 2 /4H-SiC(Si-face) heterojunctions are systematically investigated through density functional theory calculation and experimental analysis. The calculated results show that the monolayer MoS 2 /4H-SiC heterostructure is a van der Waals heterojunction because of low formation energy and shows a type-II band alignment with a valence band offset of 1.43 eV. Then the type-II band alignment of the MoS 2 /4H-SiC heterostructure is verified by x-ray photoelectron spectroscopy. However, there is a deviation of 0.44 eV in the valence band offset between the calculated results and the experimental data, which may be caused by the underestimation of the bandgap by the Perdew–Burke–Ernzerhof method and the introduction of impurities at the interface. Our experimental results reveal the type of band alignment and the combination of the MoS 2 /4H-SiC heterostructure interface, which is an effective way to understand and design photocatalysts and electronic devices.
physics, applied
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