Optimizing crucible geometry to improve the quality of AlN crystals by the physical vapor transport method
Wenhao Cao,Shouzhi Wang,Ruixian Yu,Qiubo Li,Guodong Wang,Yajun Zhu,Yuzhu Wu,Lingshuang Lv,Jingliang Liu,Xiangang Xu,Lei Zhang
DOI: https://doi.org/10.1107/s1600576724009087
IF: 4.868
2024-10-18
Journal of Applied Crystallography
Abstract:The growth quality of AlN single crystals was improved by optimizing the crucible structure for Al vapor transport with the help of finite element simulation.In the conventional crucible structure for AlN crystal growth by physical vapor transport, owing to the long molecular transport path of Al vapor and the disruption of the gas flow by the presence of a deflector, the Al vapor easily forms polycrystals in the growth domain. The result is increased internal stress in the crystals and increased difficulty in growing large‐sized crystals. On this basis, with the help of finite element simulations, a novel crucible structure is designed. This crucible not only optimizes the gas transport but also increases the radial gradient of the AlN crystal surface, making the enhanced growth rate in the central region more obvious. The thermal stresses between the deflector and the crystal are also reduced. High‐quality AlN crystals with an FWHM of 79 arcsec were successfully grown with this structure, verifying the accuracy of finite element simulation of the growth of AlN crystals. Our work has important guiding significance for the growth of high‐quality AlN crystals.
chemistry, multidisciplinary,crystallography