Two-Dimensional Silicon Atomic Layer Field-Effect Transistors: Electronic Property, Metal-Semiconductor Contact, and Device Performance

Pengpeng Sang,Qianwen Wang,Wei Wei,Lu Tai,Xuepeng Zhan,Yuan Li,Jiezhi Chen
DOI: https://doi.org/10.1109/ted.2021.3138362
IF: 3.1
2022-04-01
IEEE Transactions on Electron Devices
Abstract:To provide fully CMOS-compatible 2-D materials, novel silicon atomic-layer-based field-effect transistors (FETs) are investigated thoroughly in this work, with a focus on three 2-D silicon semiconductors hybrid honeycomb-kagome silicene (hhk-Si), large honeycomb dumbbell silicene (LHD-Si), and honeycomb dumbbell silicene (HD-Si). Based on first-principles and ballistic quantum transport simulations (QSTs), we unveil the intrinsic transport properties of the proposed 2-D silicon semiconductors, and benchmark with bulk-silicon and monolayer MoS2. More importantly, we gain an in-depth insight into electrode contact issues and device performance of LHD-Si-based Schottky-barrier (SB) FETs with different metal electrodes. Both the monolayer hhk-Si and LHD-Si exhibit excellent intrinsic transport properties, and a large ON/OFF ratio (${I} _{ ext{on}} / {I} _{ ext{off}}$ ) over 105 (${I} _{ ext{on}}$ approaching 103 $mu ext{A} / mu ext{m}$ ) can be achieved in the hhk-Si MOSFET. Moreover, with proper metal electrodes, the LHD-Si SB-FET can realize SB-free injection (Ohmic contact) and sub-thermal switching (cold-source). The LHD-Si SB-FET achieves a large ${I} _{ ext{on}}$ of 545–$660 mu ext{A} / mu ext{m}$ for Bi and Al electrodes, and a steep subthreshold swing of 48–51 mV/dec for NbTe2 and TaTe2 electrodes. This work demonstrates the promising application of 2-D silicon semiconductors in ultra-scaled FETs and the potential contact issues of metal electrodes.
engineering, electrical & electronic,physics, applied
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