Bonding of copper to silicon chips using vapor-deposited tin film

T Fujimoto,S Fukumoto,T Miyazaki,Y Kashiba,K Shiotani,K Fujimoto
DOI: https://doi.org/10.1088/1742-6596/379/1/012026
2012-08-07
Journal of Physics: Conference Series
Abstract:A bonding process between a Cu plate and a Si chip using a vapor-deposited tin film has been developed. The microstructures of the bond interface and the reliability during thermal cyclic tests were investigated. Intermetallic compounds (IMCs) of Cu3Sn and/or Au-Cu-Sn were formed at the bond interface. The stress concentration initiated fracture in the IMC layer at the corners of the bond area and the initial cracks in the IMC layer propagated through the Al layer in the metallized layer on the Si chip. Joints using a deposited tin film showed much longer lifetime than solder joints.
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