Impedance spectroscopy of polysilicon in SOI structures

Anatoly Druzhinin,Ihor Ostrovskii,Yuriy Khoverko,Stepan Nichkalo,Iurii Kogut
DOI: https://doi.org/10.1002/pssc.201300149
2013-12-09
physica status solidi c
Abstract:Polycrystalline silicon layers on the surface of oxidized silicon substrate, i.e. SOI‐structures, with initial boron concentration (of about 2.4 × 1018 cm‐3 ÷ 1.7 × 1020 cm‐3) in the vicinity to metal‐insulator transition have been investigated. Experimentally the AC performances for both non‐recrystallized and recrystallized layers correlate with DC measurements. Conductivity caused by the hopping between localized states with energy magnitude close to the Fermi level, has a weak temperature dependence in the ranges where the Shklovskii‐Efros law applies. In this case, the percolation type of charge carrier transport is observed. In contrast, the hopping conduction between localized states near the band edges has a strong temperature dependence, where the Mott law is obeyed. (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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