Status of the silicon pore optics technology

Maximilien J. Collon,Giuseppe Vacanti,Nicolas M. Barrière,Boris Landgraf,Ramses Günther,Mark Vervest,Luc Voruz,Sjoerd Verhoeckx,Ljubiša Babić,Laurens Keek,David Girou,Ben Okma,Enrico Hauser,Marco W. Beijersbergen,Marcos Bavdaz,Eric Wille,Sebastiaan Fransen,Brian Shortt,Ivo Ferreira,Jeroen Haneveld,Arenda Koelewijn,Ronald Start,Maurice Wijnperle,Jan-Joost Lankwarden,Coen van Baren,Paul Hieltjes,Jan Willem den Herder,Peter Müller,Evelyn Handick,Michael Krumrey,Miranda Bradshaw,Vadim Burwitz,Giovanni Pareschi,Sonny Massahi,Sara Svendsen,Desirée Della Monica Ferreira,Finn E. Christensen,Giuseppe Valsecchi,Paul Oliver,Ian Chequer,Kevin Ball,Maurice Wijnperlé,Paul J. Hieltjes,Jan-Willem den Herder,Desirée D. M. Ferreira
DOI: https://doi.org/10.1117/12.2530696
2019-09-12
Abstract:Silicon Pore Optics (SPO) uses commercially available monocrystalline double-sided super-polished silicon wafers as a basis to produce mirrors that form lightweight and stiff high-resolution x-ray optics. The technology has been invented by cosine and the European Space Agency (ESA) and developed together with scientific and industrial partners to mass production levels. SPO is an enabling element for large space-based x-ray telescopes such as Athena and ARCUS, operating in the 0.2 to 12 keV band, with angular resolution requirements up to 5 arc seconds. SPO has also shown to be a versatile technology that can be further developed for gamma-ray optics, medical applications and for material research. This paper will summarise the status of the technology and of the mass production capabilities, show latest performance results and discuss the next steps in the development.
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