X-Ray Optics R&D At Nslsii Focus On Optical Metrology Development

Mourad Idir,Lei Huang,Konstantine Kaznatcheev,Shinan Qian,Guillaume Dovillaire,Rafael Mayer
DOI: https://doi.org/10.1117/12.2248223
2016-01-01
Abstract:The push for high quality X-ray optics is closely linked to improvements in metrology technology. During the last decade, we have seen an ultra-fast progress in X-ray optics performances. This enhancement is directly linked to the development of the necessary tools to control these optical components. These metrology tools are necessary for the fabrication (to guide some polishing deterministic process) and also for the ultimate characterization used to validate surface parameters (often inside their own mechanical support) prior to installation in a beamline. It is now necessary to characterize optical surface figure, slope errors and roughness on meter-long optics over spatial frequencies as short as 0.1 mm and with slope errors reaching less than 100 nrad rms or surface figure errors close to 1 nm in order to not spoiled and preserve the high brightness made available by third and fourth generation synchrotron/ FEL sources like NSLSII or LCLS. For this purpose, the new NSLS-II Optical Metrology Laboratory (NSLSII-OML) includes commercial instruments for measuring long spatial frequency figure errors, mid spatial frequencies and high frequency roughness and had started some R&D activities. This paper provides a brief description of the instruments currently available in the laboratory and gives an overview of the very active R&D efforts within the NSLSII-OML.
What problem does this paper attempt to address?