Impact of dislocations on the thermal conductivity of gallium nitride studied by time-domain thermoreflectance

Kihoon Park,Can Bayram
DOI: https://doi.org/10.1063/1.5126970
IF: 2.877
2019-11-14
Journal of Applied Physics
Abstract:GaN thermal conductivity (<i>κ</i><sub>GaN</sub>) of hydride vapor phase epitaxy grown GaN (HVPE GaN), high nitride pressure grown GaN (HNP GaN), and metal-organic chemical vapor deposition grown GaN on sapphire (GaN/sapphire) and on Si(111) (GaN/Si) are measured as 204.7 (±4.6), 206.6 (±6.8), 191.5 (±10.5), and 164.4 (±3.2) W/m K, respectively, using the time-domain thermoreflectance technique. Dislocation densities (<i>σ</i><sub>D</sub>) of HVPE GaN, HNP GaN, GaN/sapphire, and GaN/Si are measured as 4.80 (±0.42) × 10<sup>5</sup>, 3.81 (±0.08) × 10<sup>6</sup>, 2.43 (±0.20) × 10<sup>8</sup>, and 1.10 (±0.10) × 10<sup>9 </sup>cm<sup>−2</sup>, respectively, using cathodoluminescence and X-ray diffraction studies. Impurity concentrations of Si, H, C, and O are measured by secondary ion mass spectroscopy studies. The relationship between <i>κ</i><sub>GaN</sub> and <i>σ</i><sub>D</sub> is modeled through a new empirical model <i>κ</i><sub>GaN</sub> = 210 tanh<sup>0.12</sup>(1.5 × 10<sup>8</sup>/<i>σ</i><sub>D</sub>). A modified Klemens's model, where dislocation induced scattering strength is increased, is proposed to explain the experimental rate of decrease in <i>κ</i><sub>GaN</sub> with increasing <i>σ</i><sub>D</sub>. Overall, this work reports how <i>κ</i><sub>GaN</sub> of heteroepitaxially-grown GaN can be estimated based on <i>σ</i><sub>D</sub>, providing key design guidelines for thermal management in GaN semiconductor devices.
physics, applied
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