Deposition and Fabrication of Sputtered Bismuth Telluride and Antimony Telluride for Microscale Thermoelectric Energy Harvesters

Samer A. Haidar,Yuan Gao,Yifan He,Jane E. Cornett,Baoxing Chen,Nigel J. Coburn,Colm Glynn,Marc T. Dunham,Kenneth E. Goodson,Nian Sun
DOI: https://doi.org/10.1016/j.tsf.2020.138444
IF: 2.1
2021-01-01
Thin Solid Films
Abstract:Thermoelectric (TE) n-type bismuth telluride (Bi2Te3) films and p-type antimony telluride (Sb2Te3) films are grown on SiO2/Si substrates via radio frequency magnetron sputtering. The crystal structures and TE properties are characterized for 1 µm and 10 µm films deposited using different deposition conditions and using various heat treatment conditions. Single-target sputtered deposition of n-type Bi2Te3 films resulted in a Te-deficient off stoichiometric films due to the evaporation of tellurium. Two-target co-sputtered deposition using Bi2Te3 and Te targets at room temperature and subsequent anneal at 250°C yielded a 10 µm n-type film with -102 µV/K for the Seebeck coefficient and 0.7 mW/K2.m for the power factor. Similarly, prepared p-type Sb2Te3 film but using a single sputtering target yielded +110 µV/K and 1.3 mW/K2.m for their Seebeck coefficient and power factor respectively. The fabrication of the micro-scale thermoelectric energy generator (µTEG) using separate n-type and p-type wafers is demonstrated.
materials science, multidisciplinary,physics, applied, condensed matter, coatings & films
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