Ab-Initio Study on Neutral Indium Diffusion in Uniaxial and Biaxial Strained Silicon Substrate

Young-Kyu Kim,Bum-Goo Cho,Soon-Yeol Park,Taeyoung Won
DOI: https://doi.org/10.1166/jctn.2009.1299
2009-11-01
Journal of Computational and Theoretical Nanoscience
Abstract:We performed ab-initio study for deciphering the energy configurations, minimum energy path (MEP), and migration energy during the diffusion of neutral indium atom in uniaxial and biaxial tensile strained {100} silicon layer. Our ab-initio calculation allowed us to figure out the transient atomistic configurations during the indium diffusion in strained silicon. We found that the lowest-energy structure (InS–SiiTd) consists of indium sitting on a substitutional site while stabilizing a silicon self-interstitial in a adjacent tetrahedral position. Our ab-initio calculation revealed that the second lowest energy structure is IniTd, the interstitial indium at the tetrahedral position. The nudged elastic band (NEB) method for estimating the MEP between the two structures revealed that the diffusion pathway of neutral indium is kept unchanged while the migration energy of indium fluctuates in an uniaxial and biaxial strained silicon.
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