Room temperature device performance of electrodeposited InSb nanowire field effect transistors

Suprem R. Das,Collin J. Delker,Dmitri Zakharov,Yong P. Chen,Timothy D. Sands,David B. Janes
DOI: https://doi.org/10.1063/1.3587638
IF: 4
2011-06-13
Applied Physics Letters
Abstract:InSb nanowires have been formed by electrodeposition in porous anodic alumina templates and employed as transistor channels. The 100 nm diameter nanowires had a zinc blende crystal structure. Single-nanowire field-effect transistors (NW-FETs) with a channel length of 500 nm exhibited on-currents of ∼40 μA, on/off ratios of ∼16–20, drain conductances of ∼71 μS and field-effect electron mobility of ∼1200 cm2 V−1 s−1. Compared with reported NW-FETs, the on-current is large and the current saturation occurs at low source-drain voltages. These characteristics can be understood in terms of velocity saturation effects with enhanced scattering.
physics, applied
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