Abstract:An oxygen-zinc plasma and an oxygen-zinc-aluminum plasma are formed by pulsed laser ablation of a Zn target or pulsed laser co-ablation of a Zn target and an Al target in an electron cyclotron resonance (ECR) discharge-generated oxygen plasma for the deposition of ZnO and Al-doped ZnO (AZO) films. The plasmas are characterized spectroscopically by time-integrated and time-resolved optical emission spectroscopy. Both the oxygen-zinc plasma and the oxygen-zinc-aluminum plasma contain excited species originally present in the working O2 gas and energetic species ablated from the targets. The optical emission of the oxygen-zinc-aluminum plasma is abundant in the emission bands of oxygen molecular ions and the emission lines of mono-atomic oxygen, zinc and aluminum atoms and atomic ions. The time-integrated spectra as well as the time-resolved spectra of the plasma emission indicate that the oxygen species in the ECR oxygen plasma experience additional excitation by the expanding ablation plumes, and the ablated species are excited frequently when traveling accompanying the plume expansion in the oxygen plasma, making the formed plasma highly excited and very reactive, which plays an important role in the reactive growth of ZnO matrix and the in-situ doping of Al into the growing ZnO matrix. The deposited ZnO and AZO films were evaluated for composition analysis by energy dispersive X-ray spectroscopy, structure characterization by X-ray diffraction and optical transmission measurement. The deposited ZnO is slightly rich in O. The Al concentration of the AZO films can be controlled and varied simply by changing the repetition rate of the laser used for Al target ablation. Both the ZnO and the AZO films are featured with hexagonal wurtzite crystal structure and exhibit high optical transparency in a wide spectral region. Al doping results in an improvement in the ultraviolet transparency, a blue shift in the absorption edge and a widening of the band gap.

Surface modification of ZnO by plasma and laser treatment

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

The Effects of Oxygen Partial Pressure and Substrate Temperature on the Structural and Optical Properties of Zno Films

Plasma-deposited reactive species assisted synthesis of colloidal zinc-oxide nanostructures

Enhanced emission and surface modification in ZnO treated with Ar, H, and O plasmas

Surface modification by high-energy heavy-ion irradiation in various crystalline ZnO facets

The Effect of Infrared Laser Irradiation on the Surface Morphology and Electrical Properties of Zinc Metal

Surface Structure Analysis of ZnO Nano-Particles Fabricated by Pulsed Nd: YAG Laser Ablation under Plasma Circumstance

Nanosecond-laser annealing of zinc oxide thin-films: The effect of the laser wavelength and fluence

Modification of surface morphology and lattice order in nanocrystalline ZnO thin films prepared by spin-coating sol–gel method

Effects of Oxygen Plasma Treatment on the Surface Properties of Ga-doped ZnO Thin Films

Tuning the structural, morphological, and optical properties of zinc (8-hydroxyquinoline) thin films by laser-irradiation for optoelectronic applications

Laser‐irradiated Zinc Oxide Thin‐film Transistors Fabricated by Solution Processing

Spectroscopic characterization of the plasmas formed during the deposition of ZnO and Al-doped ZnO films by plasma-assisted pulsed laser deposition

Influences of Substrate and Annealing on the Structural and Optical Properties and Photoluminescence of Nanocrystalline Zno Films Prepared by Plasma Assisted Pulsed Laser Deposition

Surface Modification of Mgal2o4 (111) for Growth of High-Quality Zno Epitaxial Films

Control over the Surface Properties of Zinc Oxide Powders via Combining Mechanical, Electron Beam, and Thermal Processing

A Chemical Strategy to Reinforce Electrically Pumped Ultraviolet Random Lasing from ZnO Films

Low-temperature glow discharge plasma oxidation of the Zr48Cu36Al8Ag8 bulk metallic glass

Tailoring the Morphology, Optical and Electrical Properties of DC-sputtered ZnO:Al Films by Post Thermal and Plasma Treatments

Surface Modification of Zr48Cu36Al8Ag8 Bulk Metallic Glass through Glow Discharge Plasma Nitriding