Effects of Oxygen Plasma Treatment on the Surface Properties of Ga-doped ZnO Thin Films

Ya Xue,Haiping He,Yizheng Jin,Bin Lu,Hongtao Cao,Jie Jiang,Sai Bai,Zhizhen Ye
DOI: https://doi.org/10.1007/s00339-013-7718-z
2013-01-01
Applied Physics A
Abstract:We report that oxygen plasma treatment significantly changes the surface properties of Ga-doped ZnO (GZO) thin films, leading to an increase of work function and a large reduction in contact angles. We attribute the increase of work function of the GZO thin films after oxygen plasma treatment to both the lowering of the Fermi level and the shift in ionization potential.
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