Preparation and characterization of solution deposition planarized Y2O3–Al2O3 compound seed layer for coated conductors
Yan Xue,Xin Hou,Qiming Zeng,Fei Yu,Chang Liao,Ji Li,Baolei Wang,Zhenjun Qin,Yinxiang Li
DOI: https://doi.org/10.1007/s10854-024-12827-7
2024-06-25
Journal of Materials Science Materials in Electronics
Abstract:In this work, we have successfully fabricated the second-generation YBa 2 Cu 3 O 7 (YBCO)-coated conductors on the solution deposition planarization (SDP) yttrium oxide and aluminum oxide (Y 2 O 3 -Al 2 O 3 , YAlO) templates. Distinguishing from commercially available coated conductors, the SDP-YAlO process employs chemical solution deposition to fabricate multi-layer amorphous oxides on polycrystalline metal substrates, presenting a cost-effective alternative to replace sputtering-Al 2 O 3 , sputtering-Y 2 O 3 , and electrochemical polishing processes. The detailed SDP-YAlO fabrication process has been studied systematically. The YAlO seed layer exhibits smooth and flat surface morphology with an optimal root mean square roughness (RMS) of 1.6 nm over a 5 μm x 5 μm area, indicative of a smooth surface. Furthermore, the YBCO functional layer was deposited on ion beam-assisted deposition (IBAD) MgO buffer layers, utilizing both SDP-Y 2 O 3 and SDP-YAlO as seed layers. The critical current ( J c ) uniformity of YBCO films on SDP-YAlO is much better that those on SDP-Y 2 O 3 , indicating the potential of SDP-YAlO as a promising seed layer for YBCO-coated conductors.
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied