4H‐SiC Metalens: Mitigating Thermal Drift Effect in High‐Power Laser Irradiation

Boqu Chen,Xiaoyu Sun,Xiaoxuan Li,Lu Cai,Ding Zhao,Kaikai Du,Meiyan Pan,Min Qiu
DOI: https://doi.org/10.1002/adma.202412414
IF: 29.4
2024-11-24
Advanced Materials
Abstract:A monolithic 4H‐SiC metalens with exceptional thermal stability is applied in high‐power laser applications, achieving diffraction‐limited focusing (NA 0.5, focal length 1 cm). After 1 h of 15W, 1030 nm pulsed laser irradiation, it exhibits only a 3.2 °C temperature rise and a 14 μm focal shift. Cutting 4H‐SiC wafers results in just an 11.4% depth change, marking a significant advance for high‐power laser systems and expanding their application potential. Enhancing energy density and efficiency in laser processing hinges on precise beam focusing, yet this often causes severe heat absorption and focus shifts in optical lenses. Traditional cooling methods increase cost and complexity, severely limiting versatility. Here, monolithic silicon carbide (SiC) metalens is introduced, which shows unparalleled thermal stability, integrated with a high‐power laser. This metalens achieves diffraction‐limited focusing with a numerical aperture (NA) of 0.5 and a focal length of 1 cm. Under a 1030 nm pulsed laser at 15 W for 1 h, it shows a minimal temperature rise of 3.2 °C and a tiny focal shift of 14 μm (0.1% relative), only 6% of the shift in conventional lenses. When used to cut a 4H‐SiC substrate with the same laser, the metalens exhibit only an 11.4% change in cutting depth after 1 h of operation, correlating with the focal shift results. The results unveil a groundbreaking class of compact SiC photonics devices nearly impervious to heat absorption, representing a monumental leap for high‐power laser systems and opening new horizons for their applications and efficiency.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
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