Colloidal Atomic Layer Deposition on Nanocrystals Using Ligand-Modified Precursors

Philippe B. Green,Ona Segura Lecina,Petru P. Albertini,Mark A. Newton,Krishna Kumar,Coline Boulanger,Jari Leemans,Paul B.J. Thompson,Anna Loiudice,Raffaella Buonsanti
DOI: https://doi.org/10.1021/jacs.4c00538
IF: 15
2024-04-06
Journal of the American Chemical Society
Abstract:Atomic layer deposition (ALD) is a method to grow thin metal oxide layers on a variety of materials for applications spanning from electronics to catalysis. Extending ALD to colloidally stable nanocrystals promises to combine the benefits of thin metal oxide coatings with the solution processability of the nanocrystals. However, challenges persist in applying this method, which relate to finding precursors that promote the growth of the metal oxide while preserving colloidal stability throughout...
chemistry, multidisciplinary
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